Equipment

The FEI Tecnai Osiris 200kV TEM is specifically configured for material science. While the software and electron...

For nanoscale patterning, the Raith EBPG 5000+ and EBPG 5200+ electron-beam lithography systems provide 100kV patterning of 10 nm scale devices. These electron-beam writers are...

A Bruker Dimension Fastscan AFM provides atomic force microscopy in both air and fluids using the new “Peak Force” tapping mode as well as very high speed resonant tapping mode...

Two Hitachi SU-70 scanning electron microscopes provide 1 nm resolution with a high-brightness electron source. Both SEM instruments accelerate electrons from 0.5 to 30 kV, and...

A microtome makes possible the sectioning of soft material for TEM analysis. Acessories for the Leica Ultra UC7 include a trimming mill and a glass knife maker.

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Iridium is useful for coating samples before electron microscopy. The Cressington 208 iridium sputtering tool provides very smooth, conformal coatings which are free of the...

The Fischione 1050 mill uses two argon ion beams to thin samples to just tens of nanometers, in preparation for viewing in the transmission electron microscope. Low-voltage...

The Bruker Dektak profilometer measures step heights, surface profiles and roughness using a stylus with a 12.5um radius tip. Step heights can range from ~5 nm to 1 mm, with...

The Hitachi IM4000 can be used for cross-sectioning samples (usually for SEM viewing) or for polishing surfaces. This ion mill uses a knife edge to mask the ion beam, creating...