Equipment

The FEI Tecnai Osiris 200kV TEM is a new type of microscope specifically configured for material science. While the software and electron optics share a great deal with the...

For nanoscale patterning, a Vistec EBPG 5000+ electron-beam lithography system provides 100kV patterning of 10 nm scale devices over six-inch substrates. This electron-beam...

Two Hitachi SU-70 scanning electron microscopes provide 1 nm resolution with a high-brightness electron source. Both SEM instruments accelerate electrons from 0.5 to 30 kV, and...

A Bruker Dimension Fastscan AFM provides atomic force microscopy in both air and fluids using the new “Peak Force” tapping mode as well as very high speed resonant tapping mode...

A new Leica cryomicrotome makes possible the sectioning of soft material for TEM analysis. The Leica Ultra Cryo UC7 is a state-of-the-art diamond-knife instrument operating...

Amorphous chromium films are useful for coating samples before electron microscopy. Our chromium sputtering tool provides very smooth, conformal coatings which are free of the...

The Fischione 1050 mill uses two argon ion beams to thin samples to just tens of nanometers, in preparation for viewing in the transmission electron microscope. Low-voltage...

The KLA Tencor Alphastep profilometer measures step heights, surface profiles and roughness using a stylus with a 12.5um radius tip. Step heights can range from 20nm to 160um,...

The Hitachi IM4000 can be used for cross-sectioning samples (usually for SEM viewing) or for polishing surfaces. This ion mill uses a knife edge to mask the ion beam, creating...