Because of the low bandwidth deflectors, SEM writers often require patterns to include overlaps, so that wires will not contain accidental gaps. Also, users often find it necessary to specify the order in which shapes are written, to minimize hysteresis effects. Really. Is that something you want to think about? (By the way, the e-beam system shown on the right is a JEOL 6300, which is a popular instrument in the US, but it’s not the one we have at Yale.) The table above states that the 100 kV system will require roughly 3 times the dose of electrons, but the high-voltage electron source is also three times brighter. In other words, lower resist sensitivity is offset by higher current. (“brightness” is the current in a given spot size)