Cheat Sheets
E-beam Resist Processes
Local wisdom
see also HSQ essential tips from the FAQ files
Remote wisdom
Caltech - PMMA, ma-N, SML, PMMA bilayer, ZEP (CSAR)
Un. Minnesota PMMA/PMGI bilayer
Cornell - PMMA, NEB, ZEP (CSAR), HSQ (Dow XR1541), ma-N
Development of PMMA in ethanol/water, aka “Development characteristics of polymethyl methacrylate in alcohol/water mixtures: a lithography and Raman spectroscopy study,” L.E. Ocola, M. Costales, D.J. Gosztola, Nanotechnology, Volume 27, Number 3
Electron-beam lithography training material
EBPG training is now an online Yale Canvas course. Please contact the YINQE staff for an invitation to enroll. In case you would like to see the course material without enrolling, here are the presentations. Feel free to plagiarize with impunity. No permissions or citations are required.
Getting the least from your e-beam
Beamer 4.2.0 tutorial (used on the ebpg-5000)
Beamer 6.1.1 tutorial (used on the ebpg-5200)
E-beam Tips and Tricks
For EBPG system administrators
Miscellaneous
Caltech EBPG (Note that some procedures described here are not allowed at Yale. Be sure to ask permission before trying anything new.)
Storing HSQ in liquid nitrogen
HSQ essential tips from the FAQ files
Development of PMMA in IPA/water
Conducting layer for HSQ resist
Setting up x2go to use the e-beam linux server